KemLab™ HARP™-C MMA-MAA copolymer e-Beam positive photoresist is designed for high resolution direct write e-Beam lithography. When combined with either KemLab™ 500 HARP™ or KemLab™ 1000 HARP™ PMMA photoresist, the HARP™ multi-layer system is ideal for T-gate manufacture. HARP™-C has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers. KemLab™ HARP™-C PMMA copolymer e-Beam positive photoresist is manufactured with ethyl lactate.